Products: Standard Equipment
GT-WEX 1000: Automated Silicon Etching Wet Bench
The GT Wafer Etch Bench (GT-WEX 1000) is an enclosed exhausted, automated wafer etching bench. It can be configured for a variety of process steps that are used in the manufacturing of photovoltaic solar cells. The tank options to choose from are for caustics, acids, water (rinser) and dryers. Wafers are processed through the system in standard cassettes with a linear robot that picks up the cassettes at the load station, and drops off etched, cleaned, and dried wafers at the unload station.
Specifications
GENERAL
- Throughput: 1000 cells/hour
- Cell Size: 100, 125, 150 mm pseudo square and/or square
- Cell Batch size: 100 wafers per tank
- Mode: Automatic
- Envelope Dimensions: 192"(4877mm) L x 55"(1397mm) W x 89"(2261mm) H
- Bench Material: Polypropylene
- Loading: 1 four-place cassette holder holding a total of 100 cells
- Programming: Touch screen recipe programming (process times and temperatures, rinse cycles, dryer times and temperatures, robot speeds and movements, alarm functions)
UTILITIES
- Electrical: 380/460, 3 Phase, 50/60Hz, 60 amp, other voltages on request
- Clean Dry Air: 10 CFM (0.28 m3/min). Peak flow: 20 CFM (0.57 m3/min) for less than 3% of the time.
- N2: 4 CFM (0.11 m3/min)
- Exhaust: 1800 CFM (51 m3/min)
- DI Water: 28 GPM (106 l/min)
SAFETY
- Doors: Coded magnetic interlock switches
- Exhaust loss: Photohelic® differential pressure gauge/switch
- Over temperature circuits: Heated tank and dryers
- Low liquid detection for heated tanks
OPTIONS
- Tank materials: Teflon®, PVDF, polypropylene, stainless steel
- Custom component selection: Agitators, stirrers, pH monitoring, heating and cooling systems, DI water reclaim systems, waste abatement systems, etc.
- Bench materials: Stainless Steel, fire retardant plastics
- Safety: Fire suppression C02 systems, fire retardant plastics
- Process documentation: PC based data management systems
- Chemical handling: Chemical delivery and disposal systems
